FORTEC Technology Joins OPTES at CIOE 2026; Precision Measurement Solution for VUV Optical Components Draws Industry Attention

— On-Site Report Coverage from the 10th International Workshop on Advanced Patterning Solutions (IWAPS 2026)

Release Date: 2026-09-16　|　Location: Shenzhen · Shenzhen World Exhibition & Convention Center　|　Event Period: September 9–11, 2026

From September 9 to 11, 2026, the 27th China International Optoelectronic Expo (CIOE 2026) was held at the Shenzhen World Exhibition & Convention Center. Concurrently, the 10th International Workshop on Advanced Patterning Solutions (IWAPS 2026), organized by the Chinese Optical Society, took place on September 10–11. FORTEC Technology (FORTEC), as the Greater China partner of Germany's OPTES GmbH, participated deeply in this premier event. Dr. Vincent Lin, Greater China Sales Director, delivered a technical presentation at IWAPS 2026, sharing OPTES's precision metrology and quality control solutions for VUV (Vacuum Ultraviolet) optical components with domestic and international experts in lithography and advanced patterning.

I. An Annual Optoelectronics Grand Event: Lithography Technologies in Dialogue

CIOE is one of the world's largest comprehensive professional exhibitions for the optoelectronics industry, covering the entire value chain—optical communication, optics, lasers, infrared, sensing, and new displays. This 27th edition, spanning three days, attracted optoelectronics enterprises, research institutions, and professional buyers from around the globe to Shenzhen.

Running in parallel, the 10th IWAPS 2026 is a highly influential international academic platform in its field. This year's IWAPS was organized by the Chinese Optical Society, hosted by the Institute of Microelectronics of the Chinese Academy of Sciences (IMECAS), CIOE, the Lithography Equipment Manufacturing Technology Innovation Center, and Nanjing Honest IC Technology Research Institute Co., Ltd., with technical support from SPIE (International Society for Optics and Photonics), and co-organized by the School of Integrated Circuits of the University of Chinese Academy of Sciences and the Lithography Technology Committee of the Chinese Optical Society.

Figure 1　IWAPS 2026 Organizational Structure: Organized by the Chinese Optical Society; hosted by IMECAS, CIOE, Lithography Equipment Manufacturing Technology Innovation Center, and Nanjing Honest IC; with technical support from SPIE.

Exhibition and Symposium Held Concurrently at the Same Venue

CIOE 2026 ran September 9–11 at the Shenzhen World Exhibition & Convention Center; IWAPS 2026 was held September 10–11 within the same venue. For exhibiting companies, this arrangement enabled both 'exhibition visits + conference attendance' to be accomplished under one roof—engaging directly with customers and supply chains at the booth while staying abreast of the latest research in advanced patterning at the symposium. The FORTEC and OPTES team pursued both tracks in parallel—'on-site booth visits + technical presentation at the symposium'—delivering their products and solutions to listeners who truly care about process and measurement.

Figure 2　CIOE 2026 and IWAPS 2026 Key Visuals: Exhibition and symposium held concurrently at the same venue.

II. On-Site Presentation: Precision Measurement and Quality Control of VUV Optical Components

At a parallel session on September 10, Dr. Vincent Lin delivered a technical presentation titled 'Precision Measurement Techniques for Quality Control of VUV Optical Components' on behalf of OPTES and FORTEC.

The presentation highlighted that precision metrology is the cornerstone of manufacturing and qualification for VUV optical components—at this wavelength band, specifications for surface/interface conditions and material properties are extremely stringent; even minute absorption losses or surface contamination directly degrade system performance. Addressing this core challenge, the presentation systematically introduced OPTES's comprehensive quality control framework built for the demanding performance requirements of next-generation VUV instruments:

1. High-resolution spectrophotometry: For accurate measurement of reflectance and transmittance, supporting 2D-mapping and long-term stability evaluation, making both 'intra-batch variation' and 'temporal drift' simultaneously visible.

2. Laser scattering and defect detection systems: Enable rapid surface mapping and defect identification, locating elusive local anomalies on large-format components within a short timeframe.

3. Angle-resolved scattering (ARS) and bidirectional reflectance distribution function (BRDF) measurements: For quantitative characterization of surface roughness, providing comparable and traceable metrics for polishing and coating processes.

4. Sample pretreatment and contamination control: Including ozone cleaning, laser-induced degradation analysis, and stringent detection of hydrocarbons, water films, and cleaning agent residues to minimize absorption losses.

5. In-situ particle monitoring and fluorescence studies: Validate optical component reliability under real vacuum operating conditions, preventing 'lab-qualified but tool-failed' scenarios.

The presentation emphasized that the combination of these methods provides traceable quality assurance for VUV optical components, meeting the rigorous demands for measurement accuracy and data credibility in advanced lithography, synchrotron radiation, space exploration, and other high-end applications.

Figure 3　On-site presentation: Dr. Vincent Lin, Greater China Sales Director of FORTEC, delivering the technical presentation 'Precision Measurement Techniques for Quality Control of VUV Optical Components' at the IWAPS 2026 parallel session.

Presenter

Dr. Vincent Lin — Greater China Sales Director, OPTES GmbH · FORTEC Technology

Responsible for OPTES business development and customer technical support across Greater China. Long engaged in the field of precision optical measurement, with deep familiarity with measurement requirements and process challenges for VUV/DUV optical components.

III. On-Site Response: Full House, Post-Presentation Discussions Continued

As one of the parallel sessions at IWAPS 2026, the venue was at full capacity, with representatives from universities, research institutes, and companies in lithography equipment, optical components, and vacuum coating attending the entire session.

Figure 4　IWAPS 2026 Conference Scene: The parallel session featuring the presentation was at full capacity, with attendees primarily comprising technical experts from academia and industry.

After the presentation, multiple participants engaged in detailed discussions with the presenter on specific topics including VUV-band reflectance calibration methods, surface contamination control and cleaning processes, and long-term stability testing of optical components. This type of 'process-question-driven inquiry' precisely reflects that, as domestic advanced lithography, synchrotron radiation, and space optics advance, the demand for VUV measurement capabilities has shifted from 'availability' to 'accuracy and traceability.'

IV. Key Takeaways: Solutions Heard, Partnerships Seen

Based on on-site feedback from CIOE and IWAPS, this engagement achieved three expected objectives:

1. Technical solutions recognized by professional audiences. The 'measure—clean—verify' closed-loop approach jointly presented by OPTES and FORTEC closely aligns with real measurement pain points in domestic advanced lithography and synchrotron radiation scenarios—the presentation content was precisely 'the answer attendees were looking for.'

2. Established a batch of new industry connections. During the exhibition and symposium, the team initiated preliminary communications with multiple companies and research institutions in lithography equipment, optical component manufacturing, and vacuum coating, laying the groundwork for subsequent technical对接.

3. Clarified the direction for localization services. Customers care not only about instrument specifications, but also about 'who installs, who calibrates, who maintains long-term.' This is precisely the core value of FORTEC as the regional partner.

V. About Us

Figure 5　OPTES GmbH and FORTEC Technology: Spin-off from Laser Zentrum Hannover (LZH) + Greater China Partner, jointly serving Chinese customers.

FORTEC Technology

FORTEC TECHNOLOGY (HK) Co. Limited focuses on providing advanced optical measurement and metrology solutions to customers in optoelectronics, semiconductor, and research sectors. As the Greater China partner of OPTES GmbH, FORTEC provides domestic customers with VUV/DUV optical metrology technical support, system integration, and localization services, enabling high-end measurement capabilities to be truly deployed at Chinese customers' sites.

OPTES GmbH

OPTES GmbH is a spin-off from the Laser Zentrum Hannover e.V. (LZH), specializing in Precision in Optical Metrology. Company founder Prof. Puja Kadkhoda brings over 30 years of research experience in optical characterization methods at LZH and has long been dedicated to the development and integration of complex VUV optical testing systems. Business scope covers requirement studies, feasibility analysis, and full system delivery.

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